CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis. These systems address a range of applications such as solar photovoltaics, light-emitting diodes, optical coatings, power electronics and advanced materials research. In addition to turnkey equipment, CVD Equipment provides process development, custom engineering and aftermarket service to help customers optimize performance and throughput.
Serving clients in North America, Europe and Asia, CVD Equipment has established a global sales and service network that delivers installation, training and technical support. Its modular platform approach enables scalable expansion from pilot-scale demonstration units to high-volume production systems. Through ongoing collaboration with academic institutions and industry partners, the company aims to advance thin-film deposition processes and enable emerging technologies in semiconductors and materials science.
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