Aixtron SE, founded in 1983 and headquartered in Herzogenrath, Germany, is a leading provider of deposition equipment for the compound semiconductor industry. The company’s core expertise lies in metal-organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) systems, which are used to grow epitaxial layers of materials like gallium nitride, gallium arsenide and related alloys. These systems support applications ranging from light-emitting diodes (LEDs) and laser diodes to power electronics, photonic devices and data communications components.
Operating globally, Aixtron maintains R&D, manufacturing and service facilities across Europe, Asia and North America. Key technology centers and sales offices can be found in semiconductor hubs such as South Korea, Taiwan, China, Japan and the United States, enabling close collaboration with foundries, research institutes and equipment partners. Aixtron’s reactor platforms—including planetary reactors, showerhead reactors and aerosol-based plasma systems—are designed for high throughput, precise process control and wide material compatibility.
Over its decades-long history, Aixtron has delivered several technological milestones in reactor design and production automation, contributing to the commercialization of blue and green LEDs as well as GaN-based power devices. The company continues to invest in R&D to expand its material portfolio, pursuing advanced wide-bandgap semiconductors such as gallium oxide and aluminum nitride. As a publicly traded company on the OTC Markets under the symbol AIXXF, Aixtron focuses on maintaining its innovation leadership while supporting next-generation applications in lighting, renewable energy, automotive and telecom markets.
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